Sol-Gel Deposited Sb-Doped Tin Oxide Films

Journal of Sol-Gel Science and Technology

Volumn 13, Issue 1-3, 1999, Pages 679-683

  Guglielmi, M ^a   Menegazzo, E ^a   Paolizzi, M ^b   Gasparro, G ^c   Ganz, D ^c   Putz J ^c   Aegerter, M A ^c   Hubert Pfalzgraf, L ^d   Pascual, C ^e   Duran A ^e   Willems, H X ^f   Van Bommel, M ^f   Buttgenbach L ^g   Costa, L ^h  

^a UNIVERSITY OF PADOVA   (Italy)

^b Istituto Giordano SpA   (Italy)

^c INM LEIBNIZ INSTITUTE FOR NEW MATERIALS   (Germany)

^d Lab de Chimie Moléculaire   (France)

^e INSTITUTO DE CERÁMICA Y VIDRIO   (Spain)

^f PHILIPS RESEARCH LABORATORIES   (Netherlands)

^g MERCK KGAA   (Germany)

^h Gel Design and Engineering (GDE)   (Italy)

Author keywords

Electrical properties; Optical properties; Sb doped tin oxide; Thin films; Transparent conductors

Indexed keywords

ANTIMONY; COMPOSITION EFFECTS; CRYSTAL STRUCTURE; DEPOSITION; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY OF SOLIDS; GRAIN BOUNDARIES; SINTERING; SOL-GELS; THIN FILMS; TIN COMPOUNDS; TRANSPARENCY; ELECTRIC CONDUCTORS;

TIN OXIDE;

CONDUCTIVE FILMS; SOL-GELS;

CRYSTALLITE SIZE; SB-DOPED TIN OXIDE; TRANSPARENT COATINGS; TRANSPARENT CONDUCTORS;

EID: 0032317512     PISSN: 09280707     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (20)

1. K.L. Chopra, S. Major, and D.K. Pandya, Thin Solid Films 102, 1 (1983).
2. C.G. Granquist, Thin Solid Films 193/194, 730 (1990).
3. C.M. Lampert, Solar Energy Mater. 6, 1 (1981).
4. W. Göpel and K.-D. Schierbaum, Sens. Actuators B 26/27, 1 (1995).
5. Yoshizumi and K. Wakabayashi, Plastics Eng. 61 (1987).
6. Ono, T. Yamanaka, Y. Kubokawa, and M. Komiyama, J. Catal. 109, 423 (1988).
7. C.J.R. Gonzales-Oliver and I. Kato, J. Non-Cryst. Solids 82, 400 (1986).
8. G. Gowda and D. Nguyen, Thin Solid Films 136, L39 (1986).
9. Y. Takahashi and Y. Wada, J. Electrochem. Soc. 137, 267 (1990).
10. J.C. Giuntini, W. Granier, J.V. Zanchetta, and A. Taha, J. Mater. Sci. Lett. 9, 1383 (1990).
11. B. Orel, U. Lavrencic-Stangar, Z. Crnjak-Orel, P. Bukovec, and M. Kosec, J. Non-Cryst. Solids 167, 272 (1994).
12. J.P. Chatelon, C. Terrier, E. Bernstein, R. Berjoan, and J.A. Roger, Thin Solid Films 247, 162 (1994).
13. S.-S. Park, H.X. Zheng, J.D. Mackenzie, Mater. Lett. 22, 175 (1995).
14. C. Terrier, J.P. Chatelon, R. Berjoan, J.A. Roger, Thin Solid Films 263, 37 (1995).
15. P. Olivi, E.C. Pereira, E. Longo, T.A. Varella, and L.O. de S. Bulhões, J. Electrochem., Soc. 140, L81 (1993).
16. E. Shanti, V. Dutta, A. Banerjee, and K.L. Chopra, J. Appl. Phys. 51, 6243 (1980).
17. Concerted European Action on "Sol-Gel Processing for Advanced Industrial Material Technologies."
18. M. Guglielmi, E. Menegazzo, M. Paolizzi, G. Gasparro, D. Ganz, J. Pütz, M.A. Aegerter, L. Hubert-Pfalzgraf, C. Pascual, A. Durán, H.X. Willems, M. van Bommel, L. Büttgenbach, and L. Costa, to be published.
19. S. Gaign and L.G. Hubert-Pfalzgraf, to be published.
20. D. Bélanger, J.P. Dodelet, B.A. Lombos, and J.I. Dickson, J. Electrochem. Soc. 132, 1398 (1985).