Mechanism of anisotropic etching of silicon in a complexant alkaline system

Proceedings of the International Semiconductor Conference, CAS

Volumn 2, Issue , 1998, Pages 353-356

  Moldovan, Carmen ^a   Iosub, Rodica ^a   Nechifor, Ghe ^a   Dascalu, D ^a   Craciunoiu, F ^a   Serban, B ^a  

^a NATIONAL INSTITUTE FOR RESEARCH AND DEVELOPMENT IN MICROTECHNOLOGIES   (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ETCHING; PH; SURFACE ROUGHNESS;

COMPLEXANT ALKALINE SYSTEMS;

SEMICONDUCTING SILICON;

EID: 0032316871     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)