Structure and properties of CeN thin films deposited in arc discharge

Vacuum

Volumn 51, Issue 4, 1998, Pages 691-694

  Xiao, S Q ^a   Tsuzuki, K ^a   Lungu, C P ^a,b   Takai, O ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE FOR LASER   (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; CERIUM COMPOUNDS; CRYSTAL ORIENTATION; DEPOSITION; ELECTRIC ARCS; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRIC CURRENTS; ELECTRON BEAMS; HARDNESS; LIGHT EMISSION; NITROGEN; PARAMAGNETISM;

CERIUM NITRIDE; ELECTRON BEAM EVAPORATION; REACTIVE ARC ION PLATING;

THIN FILMS;

EID: 0032316672     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(98)00276-0     Document Type: Article

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