Effects of bottom electrodes on the leakage properties of sputtered BST thin films

Integrated Ferroelectrics

Volumn 21, Issue 1 -4 pt 1, 1998, Pages 185-195

  Ahn, Joon Hyung ^a   Choi, Gwang Pyo ^a   Choi, Won Youl ^a   Lee, Won Jae ^a   Yoon, Soon Gil ^a   Kim, Ho Gi ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BARIUM TITANATE; CURRENT VOLTAGE CHARACTERISTICS; DIELECTRIC RELAXATION; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTROCHEMICAL ELECTRODES; ELECTROLYTIC CAPACITORS; LEAKAGE CURRENTS; MAGNETRON SPUTTERING; METALLORGANIC CHEMICAL VAPOR DEPOSITION; RUTHENIUM; SPUTTER DEPOSITION; THIN FILMS;

TIME-DEPENDENT CURRENTS;

DIELECTRIC FILMS;

EID: 0032314854     PISSN: 10584587     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1080/10584589808202062     Document Type: Article

References (17)