Tri-layer a-Si:H TFTs on polymeric substrates

Annual Device Research Conference Digest

Volumn , Issue , 1998, Pages 126-127

  Thomasson, D B ^a   Bonse, M ^a   Koval, R J ^a   Huang, J R ^a   Wronski, C R ^a   Jackson, T N ^a  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CURRENT VOLTAGE CHARACTERISTICS; HEAT TRANSFER; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYIMIDES; SEMICONDUCTING GLASS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES; SILICON NITRIDE; SUBSTRATES; TEMPERATURE CONTROL; THERMAL CONDUCTIVITY;

FLATNESS; HYDROGENATED AMORPHOUS SILICON;

THIN FILM TRANSISTORS;

EID: 0032312253     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)