Segregation of Cu on etched and non-etched Al(Cu) surface

Materials Research Society Symposium - Proceedings

Volumn 516, Issue , 1998, Pages 77-82

  Li, Hua ^a   Maex, Karen ^a   Brijs, Bert ^a   Conard, Thierry ^a   Vandervorst, Wilfried ^a   Baklanov, Michael ^a   Boullart, Werner ^a   Froyen, Ludo ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COPPER; COPPER OXIDES; DIFFUSION IN SOLIDS; DRY ETCHING; METALLIC FILMS; PLASMA ETCHING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEGREGATION (METALLOGRAPHY); SEMICONDUCTING ALUMINUM COMPOUNDS; SURFACE PHENOMENA; X RAY PHOTOELECTRON SPECTROSCOPY;

COPPER CHLORIDE; COPPER DICHLORIDE;

SEMICONDUCTING FILMS;

EID: 0032311980     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-516-77     Document Type: Conference Paper

References (10)