Analysis of stray magnetic field at the substrate and effect of applying external magnetic field in facing targets sputtering

Vacuum

Volumn 51, Issue 4, 1998, Pages 715-718

  Ichihara, T ^a   Nakagawa, S ^a   Naoe, M ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; AMORPHOUS FILMS; COBALT ALLOYS; FERROMAGNETIC MATERIALS; MAGNETIC ANISOTROPY; MAGNETIC FIELD EFFECTS; MAGNETIC PERMEABILITY; PLASMA CONFINEMENT; SOFT MAGNETIC MATERIALS; SUBSTRATES;

FACING TARGETS SPUTTERING (FTS);

SPUTTERING;

EID: 0032310751     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(98)00281-4     Document Type: Article

References (2)

1. Naoe, M., Yamanaka, S. and Hoshi, Y., IEEE Trans. Magn., 1980, 16, 646.
2. Matsuoka, M., Hoshi, Y., Naoe, M. and Yamanaka, S., IEEE Trans. Magn., 1982, 23, 1119.