Effects of CH4 addition to Ar-O2 discharge gases on resistivity and structure of ITO coatings

Vacuum

Volumn 51, Issue 4, 1998, Pages 785-789

  Kusano, E ^a   Kashiwagi, N ^a   Kobayashi, T ^a   Nanto, H ^a   Kondo, I ^b   Kinbara, A ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

^b DENSO CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; BOROSILICATE GLASS; CERAMIC COATINGS; CRYSTAL ORIENTATION; ELECTRIC CONDUCTIVITY OF SOLIDS; LIGHT ABSORPTION; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; METHANE; OXYGEN; SEMICONDUCTING INDIUM COMPOUNDS; SPUTTER DEPOSITION;

INDIUM TIN OXIDE;

SEMICONDUCTING FILMS;

EID: 0032310367     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(98)00291-7     Document Type: Article

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