Quantitative analysis of HRTEM images from amorphous materials. I: About the estimation of Cs and δf from HRTEM diffractograms

EPJ Applied Physics

Volumn 4, Issue 1, 1998, Pages 11-26

  Baik, H S ^a   Epicier, T ^a   Van Cappellen, E ^b  

^a UNIVERSITÉ DE LYON   (France)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; COMPUTER SIMULATION; IMAGE ANALYSIS; LEAST SQUARES APPROXIMATIONS; MATHEMATICAL MODELS; THICKNESS MEASUREMENT; TRANSMISSION ELECTRON MICROSCOPY;

DIFFRACTOGRAMS; LEAST SQUARES FITTING; SPHERICAL ABERRATION;

SEMICONDUCTING GERMANIUM;

EID: 0032309752     PISSN: 12860042     EISSN: None     Source Type: Journal    
DOI: 10.1051/epjap:1998240     Document Type: Article

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