Quantitative measure of EM-induced drift in sub-micron Al lines

Materials Research Society Symposium - Proceedings

Volumn 516, Issue , 1998, Pages 33-38

  Witt, C ^a   Volkert, C A ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; CRYSTAL MICROSTRUCTURE; ELECTROMIGRATION; ENERGY DISPERSIVE SPECTROSCOPY; PASSIVATION; SEMICONDUCTING ALUMINUM COMPOUNDS; STRESS ANALYSIS; TITANIUM; TITANIUM NITRIDE;

FOCUSED ION BEAM (FIB) IMAGING;

SEMICONDUCTOR DEVICE TESTING;

EID: 0032309668     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-516-33     Document Type: Conference Paper

References (6)