Study on deposition mechanism of nc-Si:H films grown by plasma enhanced chemical vapor deposition

Zhenkong Kexue yu Jishu Xuebao/Vacuum Science and Technology

Volumn 18, Issue 4, 1998, Pages 283-288

  Peng, Yingcai ^a   He, Yuliang ^a   Liu, Ming ^a  

^a HEBEI UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; MICROSTRUCTURE; PLASMAS; THERMODYNAMICS;

DEPOSITION MECHANISM;

THIN FILMS;

EID: 0032308976     PISSN: 02539748     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (8)