Removal of NF3 from semiconductor process flue gases by tandem packed bed plasma-adsorbent hybrid systems

Conference Record - IAS Annual Meeting (IEEE Industry Applications Society)

Volumn 3, Issue , 1998, Pages 1845-1852

  Chang, J S ^a   Kostov, K G ^a   Urashima, K ^a   Yamamoto, T ^a   Okayasu, Y ^a   Kato, T ^a   Iwaizumi, T ^a   Yoshimura, K ^a  

^a MCMASTER UNIVERSITY   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORBENTS; ATMOSPHERIC PRESSURE; BARIUM TITANATE; FLUE GASES; NITROGEN COMPOUNDS; REACTION KINETICS; SEMICONDUCTOR DEVICE MANUFACTURE;

NITROGEN TRIFLUORIDE; PACKED BED PLASMA-ADSORBENT HYBRID SYSTEMS;

AIR POLLUTION CONTROL;

EID: 0032308678     PISSN: 01972618     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (21)