Characterization of X-ray contact microscopic imaging in keV spectral region using laser produced plasmas

Journal of X-Ray Science and Technology

Volumn 8, Issue 2, 1998, Pages 135-143

  Chakera, J A ^a   Kumbhare, S R ^a   Gupta, P D ^a  

^a RAJA RAMANNA CENTRE FOR ADVANCED TECHNOLOGY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVE DIFFRACTION; LASER PRODUCED PLASMAS; LASER PULSES; LIGHT EMISSION; MICROSTRUCTURE; OPTICAL GLASS; OPTICAL RESOLVING POWER; OPTIMIZATION; PHOTONS; PHOTORESISTS; STATISTICAL METHODS; DIFFRACTION; IMAGING TECHNIQUES; PARAMETER ESTIMATION;

CONTACT IMAGING; X RAY CONVERSION EFFICIENCY; CONVERSION EFFICIENCY; DIFFRACTION BLURRING; MILLISECOND; SPATIAL RESOLUTION;

X RAY MICROSCOPES;

EID: 0032308035     PISSN: 08953996     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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