Influence of ion beam irradiation on crystallographic structure and surface morphology of aluminium nitride thin films

Ceramics International

Volumn 24, Issue 6, 1998, Pages 427-432

  Watanabe, Yoshihisa ^a   Nakamura, Yoshikazu ^a  

^a NATIONAL DEFENSE ACADEMY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CERAMIC MATERIALS; CRYSTAL STRUCTURE; ION BEAMS; ION BOMBARDMENT; MORPHOLOGY; NITROGEN; RADIATION EFFECTS; SURFACES; SYNTHESIS (CHEMICAL); THIN FILMS; X RAY DIFFRACTION;

ALUMINUM NITRIDE; THIN FILM X RAY DIFFRACTION;

NITRIDES;

EID: 0032305442     PISSN: 02728842     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0272-8842(97)00031-X     Document Type: Article

References (14)

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