Aluminium metallisation of argon and oxygen plasma-modified polycarbonate thin film surfaces

Applied Surface Science

Volumn 136, Issue 4, 1998, Pages 280-297

  Rastomjee, C S ^a   Keil, M ^a,d   Sotobayashi, H ^a   Bradshaw, A M ^a   Lamont, C L A ^b   Gador, D ^c   Umbach, E ^c  

^a FRITZ HABER INSTITUT DER MAX PLANCK GESELLSCHAFT   (Germany)

^b UNIVERSITY OF HUDDERSFIELD   (United Kingdom)

^c UNIVERSITY OF WÜRZBURG   (Germany)

^d LINKÖPING UNIVERSITY   (Sweden)

Author keywords

Aluminium metallisation; Bis phenol A polycarbonate; Microwave plasma etching; Photoemission; Polymer film metal interface; X ray absorption spectroscopy

Indexed keywords

ALUMINUM; ARGON; CHEMICAL BONDS; DIFFUSION; INTERFACES (MATERIALS); METALLIZING; MONOLAYERS; OXYGEN; PLASMA ETCHING; POLYCARBONATES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

BISPHENOL A POLYCARBONATE; MICROWAVE PLASMA ETCHING; X RAY ABSORPTION SPECTROSCOPY;

SURFACE TREATMENT;

EID: 0032305320     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00348-1     Document Type: Article

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