Development of TiNi shape memory alloy film deposited by sputtering from separate Ti and Ni targets

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3512, Issue , 1998, Pages 138-145

  Ohta, Akihiro ^a   Bhansali, Shekhar ^a   Kishimoto, Isao ^a   Umeda, Akira ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL STRUCTURE; CRYSTALLIZATION; DIFFERENTIAL SCANNING CALORIMETRY; MARTENSITIC TRANSFORMATIONS; MICROELECTROMECHANICAL DEVICES; NICKEL; SHAPE MEMORY EFFECT; SPUTTER DEPOSITION; TITANIUM; TITANIUM ALLOYS; X RAY CRYSTALLOGRAPHY;

TITANIUM-NICKEL ALLOYS;

METALLIC FILMS;

EID: 0032304949     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.324049     Document Type: Conference Paper

References (11)