Preparation of Fe-Si thin films by chemical vapor deposition

International Conference on Thermoelectrics, ICT, Proceedings

Volumn , Issue , 1998, Pages 237-240

  Mukaida, M ^a   Hiyama, I ^a   Tsunoda, T ^a   Imai, Y ^a  

^a NATL INST OF MAT AND CHEM RES   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY MEASUREMENT; FILM PREPARATION; IRON; IRON COMPOUNDS; SEEBECK EFFECT; SEMICONDUCTING SILICON; SILANES; SILICON CARBIDE; SUBSTRATES;

BISCYCLOPENTADIENYLIRON; TETRAMETHYLSILANE;

SEMICONDUCTING FILMS;

EID: 0032304576     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)