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Volumn 533, Issue , 1998, Pages 321-326

Selective/non-selective epitaxy process for a novel SiGe HBT architecture

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; REACTIVE ION ETCHING; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR DOPING; SEMICONDUCTOR GROWTH; SUBSTRATES;

EID: 0032304565     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (1)

References (6)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.