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Volumn 533, Issue , 1998, Pages 321-326
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Selective/non-selective epitaxy process for a novel SiGe HBT architecture
a
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Author keywords
[No Author keywords available]
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Indexed keywords
EPITAXIAL GROWTH;
REACTIVE ION ETCHING;
SEMICONDUCTING SILICON COMPOUNDS;
SEMICONDUCTOR DEVICE MANUFACTURE;
SEMICONDUCTOR DEVICE STRUCTURES;
SEMICONDUCTOR DOPING;
SEMICONDUCTOR GROWTH;
SUBSTRATES;
SELECTIVE/NON-SELECTIVE EPITAXY;
HETEROJUNCTION BIPOLAR TRANSISTORS;
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EID: 0032304565
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (1)
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References (6)
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