Inductively coupled plasma etch of DUV MoSi photomasks: A designed study of etch chemistries and process results

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3546, Issue , 1998, Pages 88-97

  Constantine, C ^a   Johnson, D ^a   Westerman, R J ^a   Hourd, A ^a  

^a Qualtx Technology Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MOLYBDENUM COMPOUNDS; PLASMA DENSITY; PLASMA ETCHING; QUARTZ; SURFACE ROUGHNESS;

EMBEDDED PHASE SHIFT MATERIALS; INDUCTIVELY COUPLED PLASMAS; MOLYBDENUM SILICIDE; PHOTOMASKS;

MASKS;

EID: 0032303019     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.332879     Document Type: Conference Paper

References (4)