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Volumn 490, Issue , 1998, Pages 181-186
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Modelling analysis of oxygen transport during Czochralski growth of silicon crystals
a a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
COMPUTER SIMULATION;
HEAT TRANSFER;
LAMINAR FLOW;
MATHEMATICAL MODELS;
OXIDES;
OXYGEN;
SEMICONDUCTING SILICON;
TRANSPORT PROPERTIES;
TURBULENT FLOW;
GLOBAL HEAT TRANSFER;
OXYGEN TRANSPORT;
SILICON CRYSTALS;
CRYSTAL GROWTH FROM MELT;
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EID: 0032302927
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (23)
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References (7)
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