Ion beam techniques for low K materials characterization

Materials Research Society Symposium - Proceedings

Volumn 511, Issue , 1998, Pages 125-131

  Bakhru, H ^a   Kumar, A ^a   Kaplan, T ^a   Delarosa, M ^a   Fortin, J ^a   Yang, G R ^a   Lu, T M ^a   Kim, S ^a   Steinbruchel, C ^a   Tang, X ^a   Moore, J A ^a   Wang, B ^a   McDonald, J ^a   Nitta, S ^a   Pisupatti, V ^a   et al , ^a  

^a STATE UNIVERSITY OF NEW YORK   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; CHEMICAL ANALYSIS; DIFFUSION; INTERFACES (MATERIALS); ION BEAMS; POROSITY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICA; THICKNESS MEASUREMENT;

FLUORINE DIFFUSION; INTERFACE EFFECTS; ION BEAM ANALYSIS; NUCLEAR REACTION ANALYSIS; PARTICLE INDUCED X RAY EMISSION; POROSITY MEASUREMENT;

DIELECTRIC MATERIALS;

EID: 0032302791     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-511-125     Document Type: Conference Paper

References (9)