Surface plasmon excitations in the wake of hollow atom relaxation at surfaces

Applied Surface Science

Volumn 136, Issue 4, 1998, Pages 269-279

  Mrogenda, J ^a   Ducree J ^a   Reckels, E ^a   Leuker, J ^a   Andra H J ^a  

^a UNIVERSITY OF MÜNSTER   (Germany)

Author keywords

Hollow atom relaxation; Plasmon excitation; Surface

Indexed keywords

ALUMINUM; ATOMS; AUGER ELECTRON SPECTROSCOPY; CHARGED PARTICLES; ELECTRON EMISSION; ELECTRON ENERGY LEVELS; ELECTRON SCATTERING; IONIZATION; IONS; MATHEMATICAL MODELS; RELAXATION PROCESSES; SILICON;

HIGHLY CHARGED ION; HOLLOW ATOM RELAXATION; SURFACE PLASMON EXCITATION;

SURFACE STRUCTURE;

EID: 0032302206     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00347-X     Document Type: Article

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