Investigation of pretreated silicon wafers for CVD growth of diamond film

Crystal Research and Technology

Volumn 33, Issue 3, 1998, Pages 441-448

  Wei, Jiang ^c   Ahn, Jaeshin ^a   Hing, Chua Lye ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b STEAG AST Electronik Far E Pte Ltd   (Singapore)

^c CHARTERED SEMICONDUCTOR MANUFACTURING LTD   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

CARBONIZATION; CHEMICAL VAPOR DEPOSITION; ETCHING; FILM GROWTH; LATTICE CONSTANTS; NUCLEATION; PHOTOLUMINESCENCE; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS;

MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION;

DIAMOND FILMS;

EID: 0032301964     PISSN: 02321300     EISSN: None     Source Type: Journal    
DOI: 10.1002/(sici)1521-4079(1998)33:3<441::aid-crat441>3.0.co;2-e     Document Type: Article

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