Electromigration study of Al/low k dielectric line structures

Materials Research Society Symposium - Proceedings

Volumn 511, Issue , 1998, Pages 353-358

  Wang, P H ^a   Pellerin, J G ^a   Fox III, R J ^a   Ho, P S ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CRYSTAL MICROSTRUCTURE; ELECTRIC RESISTANCE MEASUREMENT; ELECTRON DIFFRACTION; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; INTEGRATED CIRCUITS; PERMITTIVITY; POLYMERS; SCANNING ELECTRON MICROSCOPY; SILICA; TRANSMISSION ELECTRON MICROSCOPY;

DIELECTRIC LINE STRUCTURE; ELECTRON BACK SCATTER DIFFRACTION; GRAIN ORIENTATION; LOW DIELECTRIC CONSTANT; ON CHIP INTERCONNECTS; POLYARYLENE ETHER; TETRAETHYLORTHOSILICATE; VOID MORPHOLOGY;

ELECTROMIGRATION;

EID: 0032301909     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)