Characteristics of material for photoresist spin coating: Property for reduction of photoresist consumption

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 37, Issue 12 PART A, 1998, Pages

  Sanada, Masakazu ^a   Nakano, Kayoko ^a   Matsunaga, Minobu ^a  

^a DAINIPPON SCREEN MFG CO LTD   (Japan)

Author keywords

Composition; Consumption; Photoresist; Prespin; Reduction; Spin coating

Indexed keywords

COATING TECHNIQUES; EVAPORATION; SOLVENTS; VISCOSITY OF LIQUIDS;

SPIN COATING;

PHOTORESISTS;

EID: 0032298622     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.l1448     Document Type: Article

References (6)

1. F. C. Chou, S. C. Gong, M. W. Wang and K. T. Li: Fluids Eng. Div. Conf. 4 (1996) 553.
2. T. E. Salamy, D. Brzozowy, E. Fitzgerald, G. Sienko and P. Wakefield: Proc. Electrochem. Soc. 90-1 (1990) p. 36.
3. D. E. Boronside, C. W. Macosko and L. E. Scriven: J. Electrochem. Soc. 138 (1991) 317.
4. G. F. Damon: Proc. Kodac Seminar on Microminiaturization (Kodak, Rochester, NY, 1966) p. 36.
5. T. Yada, T. Maejima, M. Aoki and M. Umesaki: Jpn. J. Appl. Phys. 34 (1995) 6279.
6. D. E. Boronside and R. A. Brown: J. Appl. Phys. 73 (1993) 585.