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Volumn 511, Issue , 1998, Pages 111-116

Porous silica: a potential material for low dielectric constant applications

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTIONS; DEPOSITION; DIELECTRIC MATERIALS; DIELECTRIC PROPERTIES; ELECTRIC PROPERTIES; FILM PREPARATION; INTEGRATED CIRCUIT MANUFACTURE; PERMITTIVITY; POROUS MATERIALS; SOL-GELS; THICKNESS MEASUREMENT; THIN FILMS;

EID: 0032298119     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-511-111     Document Type: Conference Paper
Times cited : (4)

References (10)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.