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Volumn 511, Issue , 1998, Pages 111-116
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Porous silica: a potential material for low dielectric constant applications
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL REACTIONS;
DEPOSITION;
DIELECTRIC MATERIALS;
DIELECTRIC PROPERTIES;
ELECTRIC PROPERTIES;
FILM PREPARATION;
INTEGRATED CIRCUIT MANUFACTURE;
PERMITTIVITY;
POROUS MATERIALS;
SOL-GELS;
THICKNESS MEASUREMENT;
THIN FILMS;
COLLOIDAL SILICA;
POTASSIUM SILICATE;
SPIN COATING;
SILICA;
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EID: 0032298119
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-511-111 Document Type: Conference Paper |
Times cited : (4)
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References (10)
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