Stencil mask technology for ion beam lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3546, Issue , 1998, Pages 194-205

  Ehrmann, Albrecht ^a   Huber, Sabine ^a   Kaesmaier, Rainer ^a   Oelmann, Andreas ^a   Struck, Thomas ^a   Springer, Reinhard ^a   Butschke, Joerg ^a   Letzkus, Florian ^a   Kragler, Karl ^a   Loeschner, Hans ^a   Rangelow, Ivo ^a  

^a SIEMENS AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; ELECTRON BEAM LITHOGRAPHY; ION BEAM LITHOGRAPHY; ION BOMBARDMENT; MICROELECTRONIC PROCESSING; PLASMA ETCHING; RADIATION DAMAGE; RADIATION PROTECTION; SILICON ON INSULATOR TECHNOLOGY; SILICON WAFERS;

RETICLES; STENCIL MEMBRANE MASKS; WAFER FLOW PROCESS;

MASKS;

EID: 0032297420     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.332827     Document Type: Conference Paper

References (5)