Interfacial reactions in multilayers intended for microelectronics devices

Materials Research Society Symposium - Proceedings

Volumn 514, Issue , 1998, Pages 547-552

  Federspiel, X ^a   Voiron, F ^a   Ignat, M ^a   Marieb, T ^a   Fujimoto, H ^a  

^a UNIV GRENOBLE ALPES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; DIFFERENTIAL SCANNING CALORIMETRY; ELECTRON DEVICES; INTERFACIAL ENERGY; PHASE DIAGRAMS; REACTION KINETICS; RUTHERFORD BACKSCATTERING SPECTROSCOPY;

ENTHALPY OF FORMATION; INTERFACIAL REACTIONS; KISSINGER OZAWA APPROACH; MICROELECTRONIC DEVICES;

MULTILAYERS;

EID: 0032296993     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-514-547     Document Type: Conference Paper

References (10)