Integrated approach to semiconductor equipment monitoring

Journal of the Chinese Society of Mechanical Engineers, Transactions of the Chinese Institute of Engineers, Series C/Chung-Kuo Chi Hsueh Kung Ch'eng Hsuebo Pao

Volumn 19, Issue 6, 1998, Pages 581-591

  Chen, Argon ^a   Guo, Ruey Shan ^a   Yang, Alex ^a   Tseng, Chwan Lu ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

MONITORING; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REAL TIME SYSTEMS; STATISTICAL PROCESS CONTROL;

SEMICONDUCTOR EQUIPMENT MONITORING;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0032296837     PISSN: 02579731     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (15)