Mechanical properties of thin polysilicon films by means of probe microscopy

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3512, Issue , 1998, Pages 66-75

  Chasiotis, Ioannis ^a   Knauss, Wolfgang G ^a  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELASTIC MODULI; MICROMACHINING; POISSON RATIO; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING SILICON; STICTION; STRAIN; SURFACE ROUGHNESS; TENSILE STRENGTH; TENSILE TESTING; THIN FILMS;

DIGITAL IMAGE CORRELATION; ELECTROSTATIC GRIP; POLYSILICON;

SEMICONDUCTING FILMS;

EID: 0032296649     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.324072     Document Type: Conference Paper

References (19)