Low frequency noise in intrinsic low pressure chemical vapour deposited polysilicon resistors

EPJ Applied Physics

Volumn 3, Issue 3, 1998, Pages 283-285

  Dimitriadis, C A ^a   Brini, J ^b   Kamarinos, G ^b  

^a ARISTOTLE UNIVERSITY OF THESSALONIKI   (Greece)

^b Grenoble INP Phelma   (France)

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE; CHEMICAL VAPOR DEPOSITION; RESISTORS; SPURIOUS SIGNAL NOISE;

POLYSILICON RESISTORS;

POLYCRYSTALLINE MATERIALS;

EID: 0032296637     PISSN: 12860042     EISSN: None     Source Type: Journal    
DOI: 10.1051/epjap:1998231     Document Type: Article

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