Towards the optimization of AMT barrel reactors for silicon epitaxy

Materials Research Society Symposium - Proceedings

Volumn 490, Issue , 1998, Pages 187-192

  Masi, M ^a   Radaelli, G ^a   Roda, N ^a   Raimondi, P ^a   Carra, S ^a   Vaccari, G ^a   Crippa, D ^a  

^a POLITECNICO DI MILANO   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; COMPOSITION; COMPUTATIONAL FLUID DYNAMICS; FILM GROWTH; OPTIMIZATION; PROCESS CONTROL; REACTION KINETICS; SEMICONDUCTING SILICON; THICK FILMS; THREE DIMENSIONAL;

COLD WALL BARREL REACTOR; FILM THICKNESS; THREE DIMENSIONAL FLOW DYNAMICS;

EPITAXIAL GROWTH;

EID: 0032296451     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)