Robust reaction-transport models of MOVPE reactors

Materials Research Society Symposium - Proceedings

Volumn 490, Issue , 1998, Pages 155-160

  Theodoropoulos, C ^a   Moffat, H K ^a   Mountziaris, T J ^a  

^a UNIVERSITY AT BUFFALO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; COMPUTER SIMULATION; DESIGN; FINITE ELEMENT METHOD; FLOW OF FLUIDS; HEAT TRANSFER; MASS TRANSFER; MATHEMATICAL MODELS; OPTIMIZATION; REACTION KINETICS; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTOR GROWTH;

ARSINE; GAS PHASE REACTION KINETICS; SURFACE REACTION KINETICS; TRIMETHYL GALLIUM;

METALLORGANIC CHEMICAL VAPOR DEPOSITION;

EID: 0032295368     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (19)