Characterization of ultra-thick photoresists for MEMS applications using a 1X stepper

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3512, Issue , 1998, Pages 296-315

  Flack, Warren W ^a   Fan, Warren P ^a   White, Sylvia ^a  

^a Ultratech Stepper Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; INTEGRATED CIRCUIT MANUFACTURE; MICROMACHINING; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; THICK FILMS;

MICROFABRICATIONS; ULTRA-THICK PHOTORESIST FILMS;

MICROELECTROMECHANICAL DEVICES;

EID: 0032293166     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.324073     Document Type: Conference Paper

References (16)