Pattern transfer accuracy in deep X-ray lithography - calculation and experimental results

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3512, Issue , 1998, Pages 252-261

  Schmidt, Andreas ^a   Ehrfeld, Wolfgang ^a   Feiertag, Gregor ^a   Luettge, Regina ^a   Schmidt, Martin ^a  

^a INSTITUT FÜR MIKROTECHNIK MAINZ GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL METHODS; COMPUTER SIMULATION; FLUORESCENCE; IRRADIATION; MASKS; MICROMACHINING; SYNCHROTRON RADIATION; X RAY DIFFRACTION; X RAY SCATTERING;

ALIGNED MULTIPLE EXPOSURES; DEEP X RAY LITHOGRAPHY; MICROFABRICATIONS; PATTERN TRANSFER ACCURACY; TILTED IRRADIATIONS;

X RAY LITHOGRAPHY;

EID: 0032290184     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.324067     Document Type: Conference Paper

References (17)