Toward RF system-level integration: Process integration issues in SiGe BiCMOS

Materials Research Society Symposium - Proceedings

Volumn 533, Issue , 1998, Pages 19-30

  Freeman, G ^a   Schonenberg, K ^a   Ahlgren, D ^a   Jeng, S J ^a   Nguyen Ngoc, D ^a   Stein, K ^a   Colavito, D ^a   Subbanna, S ^a   Harame, D ^a   Meyerson, B ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BIPOLAR INTEGRATED CIRCUITS; CHEMICAL CLEANING; CMOS INTEGRATED CIRCUITS; CRYSTAL DEFECTS; EPITAXIAL GROWTH; SEMICONDUCTING SILICON COMPOUNDS;

RADIO FREQUENCY SYSTEM-LEVEL INTEGRATION;

HETEROJUNCTION BIPOLAR TRANSISTORS;

EID: 0032289441     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-533-19     Document Type: Conference Paper

References (27)