Kinetics of the C49-C54 transformation in patterned and blanket TiSi2 films: a comparison

Materials Research Society Symposium - Proceedings

Volumn 514, Issue , 1998, Pages 219-224

  La Via, F ^a   Privitera, S ^a   Grimaldi, M G ^a   Raineri, V ^a   Galli, M ^a   Marabelli, F ^a   Iannuzzi, M ^a   Miglio, L ^a  

^a CNR IMETEM   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ANNEALING; CHEMICAL VAPOR DEPOSITION; ELECTRIC RESISTANCE MEASUREMENT; INFRARED SPECTROSCOPY; MOLECULAR DYNAMICS; OPTICAL VARIABLES MEASUREMENT; REACTION KINETICS; SILICON; SUBSTRATES; TITANIUM COMPOUNDS;

INFRARED SPECTROSCOPY MEASUREMENT; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; SHEET RESISTANCE MEASUREMENT;

THIN FILMS;

EID: 0032288710     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (16)