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Volumn 66, Issue , 1998, Pages 413-420

Influence of fabrication and crystal orientation on the strength of silicon microridges

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; DRY ETCHING; REACTIVE ION ETCHING; SEMICONDUCTING SILICON; STRENGTH OF MATERIALS;

EID: 0032287987     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (6)

References (13)
  • Reference 정보가 존재하지 않습니다.

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.