High-resolution dry etch patterning of PZT for piezoelectric MEMS devices

IEEE International Symposium on Applications of Ferroelectrics

Volumn , Issue , 1998, Pages 89-92

  Zeto, R J ^a   Rod, B J ^a   Dubey, M ^a   Ervin, M H ^a   Piekarz, R C ^a   Trolier McKinstry, S ^a   Su, T ^a   Shepard, J F ^a  

^a U S ARMY RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; DIELECTRIC FILMS; DRY ETCHING; ELECTROCHEMICAL ELECTRODES; LEAD COMPOUNDS; MASKS; MICROELECTROMECHANICAL DEVICES; MILLING (MACHINING); PHOTORESISTS; PLATINUM; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY;

HIGH-RESOLUTION DRY ETCH PATTERNING; PIEZOELECTRIC MICROELECTROMECHANICAL SYSTEM (MEMS) DEVICES;

PIEZOELECTRIC DEVICES;

EID: 0032286722     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (9)