Ellipsometry as a sensor technology for the control of deposition processes

Proceedings of the IEEE Conference on Decision and Control

Volumn 3, Issue , 1998, Pages 3162-3167

  Warnick, Sean C ^a   Dahleh, Munther A ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELLIPSOMETRY; MATHEMATICAL MODELS; SENSORS;

CONTROL ORIENTED MODELS;

PROCESS CONTROL;

EID: 0032284986     PISSN: 01912216     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (13)