Responses of electron shading consistently indicating low-energy ion effect

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 1998, Pages 180-182

  Hashimoto, Koichi ^a   Hasegawa, Akihiro ^a   Shimpuku, Fumihiko ^a   Nakamura, Moritaka ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MICROSTRIP ANTENNAS; MOS CAPACITORS; PLASMAS; SILICA;

ELECTRON SHADING EFFECTS; INDUCTIVELY COUPLED PLASMA (ICP);

ULSI CIRCUITS;

EID: 0032284945     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)