Electrical degradation of CMOS devices due to focused ion beam exposure

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 1998, Pages 128-131

  Benbrik, J ^a   Perdu, P ^a   Benteo, B ^a   Desplats, R ^a   Labat, N ^a   Touboul, A ^a   Danto, Y ^a  

^a CNES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; COMPUTER SIMULATION; INTEGRATED CIRCUIT TESTING; ION BEAMS;

ELECTRICAL DEGRADATION; FOCUSED ION BEAMS (FIB);

MOSFET DEVICES;

EID: 0032284629     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)