Development of a production worthy copper CMP process

IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop

Volumn , Issue , 1998, Pages 354-363

  Wijekoon, Kapila ^a   Mishra, Sourabh ^a   Tsai, Stan ^a   Puntambekar, Kumar ^a   Chandrachood, Madhavi ^a   Redeker, Fritz ^a   Tolles, Robert ^a   Sun, Bingxi ^a   Chen, Liang ^a   Pan, Tony ^a   Li, Ping ^a   Nanjangud, Savitha ^a   Amico, Gregory ^a   Hawkins, Joe ^a   Myers, Theodore ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; CHEMICAL POLISHING; COPPER; EROSION; METAL CLEANING; SLURRIES;

CHEMICAL MECHANICAL POLISHING (CMP); OXIDE EROSION;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0032279443     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)