Analysis and modeling of systematic and defect related yield issues during early development of a new technology

IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop

Volumn , Issue , 1998, Pages 7-12

  Guldi, R ^a   Watts, J ^a   PapaRao, S ^a   Catlett, D ^a   Montgomery, J ^a   Saeki, T ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FAILURE ANALYSIS; INSPECTION; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE MODELS; SENSITIVITY ANALYSIS;

ELECTRICAL SOURCE DEFECT ANALYSIS (ESDA); END-OF-LINE FAILURE ANALYSIS (F/A);

DYNAMIC RANDOM ACCESS STORAGE;

EID: 0032278098     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)