Ultra-shallow junction formation by outdiffusion from implanted oxide

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 1998, Pages 1009-1012

  Schmitz, J ^a   van Gestel, M ^a   Stolk, P A ^a   Ponomarev, Y V ^a   Roozeboom, E ^a   van Berkum, J G M ^a   Zalm, P C ^a   Woerlee, P H ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION IN SOLIDS; ION IMPLANTATION; MOSFET DEVICES; OXIDES; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DOPING;

ULTRASHALLOW JUNCTIONS;

SEMICONDUCTOR JUNCTIONS;

EID: 0032277577     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)