Plasma process induced abnormal 1/f noise behavior in deep sub-micron MOSFETs

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 1998, Pages 124-127

  Rao, V Ramgopal ^a   Wijeratne, G ^a   Chu, D ^a   Brozek, T ^a   Viswanathan, C R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FLICKERING; SPURIOUS SIGNAL NOISE;

PLASMA DAMAGE;

MOSFET DEVICES;

EID: 0032276981     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)