Effect of plasma damage and different annealing ambients on the generation of latent interface states

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 1998, Pages 217-220

  Creusen, Martin ^a   Lee, Hean Cheal ^a   Vanhaelemeersch, Serge ^a   Groeseneken, Guido ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DEFECTS; ELECTRON TRANSITIONS; ELECTRON TRAPS; GATES (TRANSISTOR); INTERFACES (MATERIALS); PLASMA ETCHING; STRESSES;

CHARGE TRAPPING; PLASMA INDUCED CHARGING;

MOSFET DEVICES;

EID: 0032274127     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)