Effect of electron temperature and electron density on topography dependent charging (TDC) damage in inductively coupled plasma etching tool

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 1998, Pages 183-186

  Tokashiki, K ^a   Araki, M ^a   Nagase, M ^a   Noguchi, K ^a   Miyamoto, H ^a   Horiuchi, T ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; PLASMA DENSITY; SURFACE TOPOGRAPHY;

ELECTRON TEMPERATURE; INDUCTIVELY COUPLED PLASMAS (ICP); PLASMA ELECTRON DENSITY;

PLASMA ETCHING;

EID: 0032273697     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)