Explanation and quantitative model for the matching behavior of poly-silicon resistors

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 1998, Pages 771-774

  Thewes, Roland ^a   Brederlow, Ralf ^a   Dahl, Claus ^a   Kollmer, Ute ^a   Linnenbank, Carsten G ^a   Holzapfl, Birgit ^a   Becker, Jan ^a   Kissing, Jens ^a   Kessel, Sylvia ^a   Weber, Werner ^a  

^a SIEMENS AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; COMPUTER SIMULATION; GRAIN SIZE AND SHAPE; MONTE CARLO METHODS; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICE MODELS;

POLYSILICON RESISTORS;

RESISTORS;

EID: 0032272383     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)