Transient fuse scheme for plasma etch damage detection

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 1998, Pages 201-204

  Krishnan, S ^a   Brennan, K ^a   Xing, G ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; POLYCRYSTALLINE MATERIALS; SILICON WAFERS;

INDUCTIVELY COUPLED PLASMAS (ICP); PLASMA ETCH DAMAGE;

PLASMA ETCHING;

EID: 0032268508     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)